Fused Silica

Fused Silica-UV

(amorphous silicon dioxide) is produced synthetically from high purity silicon by flame hydrolysis. It differs by its high UV-transmittance from natural Fused Silica, molten from crystalline quartz.

 
UV-FS offers:
• broad transmission range
• low thermal expansion coefficient, providing high thermal stability and resistance to thermal shocks
• thermal operating range up to 800 °C
• great hardness and resistance against scratches
• very high resistance to radiation darkening
• absence of bubbles and impurities

Transmission curve of UV Fused Silica
Transmission curve of UV Fused Silica

Even it is called UV-FS normally it is the standard substrate material for a use in UV, VIS and NIR.

There is a wide range of different substrate materials available, varying in homogeneity, gra­des of laser induced fluorescence and content of bubbles, inclusions and OH.

LASEROPTIK often uses SQ0, SQ1 (former Q0, Q1, Q2), Su­pra­sil® 1+2, Corning 7980® or NIFS-U®.
In the UV-range we recommend to use optimi­zed materials like SQ0 / SQ1 E-193 or E-248 for lowest losses. Other materials can be supplied as well.

Fused Silica-IR

Transmission curve of IR Fused Silica
Transmission curve of IR Fused Silica

Overview of the Fused Silica classes used by LASEROPTIK

Typical internal transmittance Ti [%] of the FS-LO classes, 10 mm thickness

Typical internal transmittance Ti [%] of the FS-LO classes, 10 mm thickness

Classification of the FS types

Classification of the FS types

Useable transmission ranges of the FS-LO classes

Useable transmission ranges of the FS-LO classes